Web14 nov. 2014 · Photoresist Problems Ahead. Without fundamental photoresist research Moore’s Law scaling faces another threat below 10nm. November 14th, 2014 - By: Ann Mutschler. As the semiconductor industry begins its ramp to manufacturing at 10nm and below, activity is heating up involving lithography modeling. Web15 okt. 2024 · This model is useful to optimize the inclined UV lithography process of SU-8 thick photoresists and improve the efficiency of the design of some micro-electro-mechanical system devices. (Some figures in this article are in colour only in the electronic version) 1. Introduction In conventional lithography, the mask and the photoresists
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